- All sections
- C - Chemistry; metallurgy
- C23F - Non-mechanical removal of metallic material from surfaces; inhibiting corrosion of metallic material; inhibiting incrustation in general; multi-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass or or class
- C23F 1/44 - Compositions for etching metallic material from a metallic material substrate of different composition
Patent holdings for IPC class C23F 1/44
Total number of patents in this class: 172
10-year publication summary
17
|
18
|
7
|
11
|
9
|
24
|
9
|
15
|
6
|
4
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Samsung Display Co., Ltd. | 30585 |
7 |
Tessera LLC | 246 |
7 |
Atotech Deutschland GmbH | 586 |
6 |
FUJIFILM Electronic Materials U.S.A., Inc. | 270 |
6 |
DONGWOO FINE-CHEM Co., Ltd. | 1163 |
5 |
Mitsubishi Gas Chemical Company, Inc. | 3188 |
5 |
Rtx Corporation | 8674 |
5 |
Enf Technology Co., Ltd. | 37 |
4 |
Oerlikon Surface Solutions AG, Pfaffikon | 556 |
4 |
General Electric Company | 18133 |
3 |
Sumitomo Electric Industries, Ltd. | 14131 |
3 |
FUJIFILM Corporation | 27102 |
3 |
Texas Instruments Incorporated | 19376 |
3 |
Applied Materials, Inc. | 16587 |
3 |
Shenzhen China Star Optoelectronics Technology Co., Ltd. | 8635 |
3 |
Versum Materials US, LLC | 591 |
3 |
Samsung Electronics Co., Ltd. | 131630 |
2 |
Siemens AG | 24990 |
2 |
Semiconductor Energy Laboratory Co., Ltd. | 10902 |
2 |
Panasonic Intellectual Property Management Co., Ltd. | 27812 |
2 |
Other owners | 94 |